Industrial Air Filtration Systems in Electronics & Optics Industry

In the electronics and optics industries, industrial air purification systems must meet extremely high cleanliness standards, precise temperature and humidity control, and the removal of harmful gases to ensure the quality and yield of precision manufacturing processes such as semiconductor chips, optical lenses, and display panels. Below is a detailed breakdown of key application areas, corresponding air filtration solutions, and purification processes.

1. Semiconductor Cleanrooms

Requirements & Contaminants

· Cleanroom Classification: ISO Class 1-5 (Particle count ≤10 to 3,520/m³ for ≥0.1µm).

· Contaminants:

Particulate Matter: Metallic dust, silicon debris, photoresist particles (≤0.1µm).

Gaseous Pollutants: Acidic gases (HF, HCl), volatile organic compounds (VOCs).

Core Air Filtration Solutions

· Pre-Filters (MERV 8-11): Captures ≥5µm particles (fibers, dust) to protect downstream filters.

· Medium-Efficiency Bag Filters (MERV 13-15): Removes fine particulates, including PM2.5 and some chemical aerosols.

· ULPA Filters (U15-U17, per IEST-RP-CC001.6): Removes ≥0.12µm particles with ≥99.9995% efficiency.

· Chemical Filters:

· Activated Carbon Layer: Adsorbs VOCs such as isopropanol and acetone.

· Molecular Sieve: Targets acidic gas removal (HF, HCl).

· HEPA Fan Filter Unit (FFU): Integrates ULPA filtration to maintain localized laminar airflow.

· Air Shower Systems: Removes particles from personnel and materials before entry.

Purification Process

1. Pre-Filtration: Outside air passes through MERV 8-11 and MERV 13-15 filters to remove larger contaminants.

2. Temperature & Humidity Control: Precision HVAC systems maintain ±0.1°C temperature and ±2% RH humidity.

3. Final Air Filtration: ULPA filters ensure an ISO Class 1-5 cleanroom environment.

4. Airborne Molecular Contaminant (AMC) Control: Process exhaust is treated using chemical filters.

5. Recirculation & Pressurization: HEPA fan filter units ensure continuous filtration and positive pressure.

2. Optical Lens Manufacturing & Coating Workshops

Requirements & Contaminants

· Cleanroom Classification: ISO Class 6-7 (≤35,200 to 352,000 particles/m³ for ≥0.5µm).

· Contaminants:

Particulate Matter: Lens grinding dust, coating machine particles.

Gases: Solvent vapors (acetone, ethanol), coating process emissions.

Core Air Filtration Solutions

· Pre-Filters (MERV 8-11): Captures ambient dust and fibers.

· Medium-Efficiency Filters (MERV 13-15): Removes fine particles, including PM1.0.

· HEPA Filters (H13 per IEST-RP-CC001.6): Eliminates ≥0.3µm particles with 99.97% efficiency.

· Activated Carbon Filters: Adsorbs solvent vapors.

· Humidity Control Units: Maintains RH at 45-55% to prevent lens deformation.

Purification Process

1. Three-Stage Air Filtration: Pre-filters → Medium filters → HEPA filters for comprehensive particulate removal.

2. Solvent Vapor Treatment: Coating machine exhaust passes through activated carbon filters.

3. Laminar Airflow Control: HEPA fan filter units ensure localized ISO Class 5 conditions at workstations.

4. Static Control: Ionizing air blowers eliminate static buildup on lenses.

3. LCD & OLED Display Manufacturing

Requirements & Contaminants

· Cleanroom Classification: ISO Class 5-6 (Exposure areas require ISO Class 3).

· Contaminants:

Particulate Matter: Glass dust, ITO conductive layer particles.

Gaseous Pollutants: Acidic etching gases (Cl₂, NH₃).

Core Air Filtration Solutions

· Corrosion-Resistant Pre-Filters (MERV 8-11): Protects downstream filters from acid gas exposure.

· Medium-Efficiency Filters (MERV 14-15): Captures PM1.0 particulates.

· Chemical Scrubbers: Neutralizes acidic gases (e.g., Cl₂ + NaOH → NaCl + H₂O).

· HEPA Filters (H14 per IEST-RP-CC001.6): Maintains ISO Class 3 cleanliness around exposure machines.

· Air Shower Tunnels: Removes dust from transported materials.

Purification Process

1. Particulate Control: Pre-filters → Medium filters → HEPA filters for progressive filtration.

2. Exhaust Treatment: Acidic etching emissions are neutralized in chemical scrubbers.

3. Localized Ultra-Clean Areas: FFUs above exposure machines ensure ISO Class 3 conditions.

4. Humidity Control: Precision humidifiers maintain ±3% RH to prevent panel warping.

4. Laser Processing & Precision Electronics Assembly

Requirements & Contaminants

· Cleanroom Classification: ISO Class 7-8 (Real-time smoke extraction required).

· Contaminants:

Particulate Matter: Metal fumes (aluminum, copper oxides).

Gases: Ozone (O₃) generated from laser cutting.

Core Air Filtration Solutions

· Metal Dust Filtration Units: High-temperature electrostatic precipitators capture submicron metal particles.

· HEPA Filters (H13): Removes ultrafine particles and dissipates static charges.

· Activated Carbon Filters: Adsorbs ozone and organic fumes.

· Ionizing Air Bars: Neutralizes static on work surfaces.

Purification Process

1. Smoke Capture: Laser equipment integrates fume hoods and electrostatic precipitators.

2. Air Recirculation: Cleanroom fresh air is filtered through HEPA systems to maintain positive pressure.

3. Ozone Control: Activated carbon filters remove O₃ to protect equipment.

4. Static Elimination: Ionizing bars and anti-static flooring prevent ESD-related damage.

5. Optical Laboratories & Inspection Centers

Requirements & Contaminants

· Cleanroom Classification: ISO Class 5 (Sensitive to vibrations, temperature, and humidity fluctuations).

· Contaminants:

Particulate Matter: Airborne dust affecting optical precision.

Environmental Instability: Temperature and humidity variations affecting lens calibration.

Core Air Filtration Solutions

· HEPA Filters (H13): Removes ≥0.3µm particles to maintain ISO Class 5 conditions.

· Precision HVAC Units: Ensures ±0.1°C temperature stability and ±2% RH humidity control.

· Anti-Vibration Flooring: Reduces external vibrations affecting sensitive measurements.

Purification Process

1. Air Filtration: HEPA-filtered fresh air supplies the lab.

2. Environmental Control: Dedicated HVAC systems stabilize temperature and humidity.

3. Airflow Management: Top-down FFU airflow with low-level returns minimizes turbulence.